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Donaldson LITHOGUARD stand-alone particulate/chemical filtration systems improve both yield and uptime by protecting critical processes & surfaces (lenses, wafers, reticles) that are threatened by resist degradation, lens hazing, corrosion and CD variation. Available in a range of airflows, equipped with our airborne molecular contaminant (AMC) filters, to meet your critical process tool requirements.
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NEW! LITHOGUARD 12 System
Our newest system has a smaller footprint yet delivers high filtration efficiency on airborne base, acid, organic (VOC) and particle contamination for DUV semiconductor processing. Holds 12 HEPA particulate filters and 6 chemical filters.
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LITHOGUARD v2.0 System
Donaldson’s chemical contamination filtration systems are available in standard 2-, 5- or 7-filter configurations. Our patented parallel airflow distribution, designed using fluent analysis and supercomputer technology, ensures optimum contaminant removal efficiency.
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LITHOGUARD Blower Systems
Provide the required airflow, along with extra capacity for external system pressure losses. Integrated air-inlet supply fans with single-phase and three-phase motors are available for all units, and are CE- and/or UL-approved. Call us for details.
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Filters and filter refills are still available for older CFS systems and LITHOGUARD v1.0. Call us for details.
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